Si cleaning liquid
Author：admin Date：2014-11-26 08:24:21 Hits：
Typical technological process:
(1) DIW pre-cleaning - DIW pre cleaning - DY - 100 cleaner - DY - 100 cleaner - DIW cleaning-Dry cleaning
(2) DIW pre-cleaning - DIW pre cleaning - DY - 100 cleaner - DY - 100 cleaner - the DIW cleaning - DIW cleaning -DIW cleaning-Dry cleaning
Process description:
(1) Temperature range: 50-65 ℃
(2) Cleaning time: 4 to 8 min
(3) Cleaning efficacy: this product is composed of weak alkali and surfactant, not easy corrosion surface of silicon wafer, cleaning the dosage is small, the surface no residue.